The photolithography equipment market has seen considerable growth due to a variety of factors.
•In recent years, the photolithography equipment market has experienced significant expansion. It is projected to increase from $12.52 billion in 2024 to $13.77 billion in 2025, with a compound annual growth rate (CAGR) of 10.0%.
This growth during the historical period can be traced back to developments in the semiconductor industry, improvements in resolution techniques, the evolution of integrated circuits (IC), rising demand for high-speed computing, and advancements in material sciences.
The photolithography equipment market is expected to maintain its strong growth trajectory in upcoming years.
• The market size of photolithography equipment is projected to experience robust growth in the forthcoming years, expanding to reach a size of $19.88 billion by 2029 at a Compounded Annual Growth Rate (CAGR) of 9.6%.
The growth surge over the forecast period can be attributed to a rise in 5g technology, advancement in quantum computing, proliferation of IoT devices, higher efficiency in energy storage, and advent of flexible electronics. Key trends expected during the forecast period include the adoption of wafer-level packaging, the emergence of maskless lithography, implementation of 3d semiconductor stacking, use of directed self-assembly (DSA), and the shift towards extreme ultraviolet (EUV) lithography.
The photolithography equipment market is anticipated to grow due to a surge in the demand for Internet of Things (IoTs). The IoT is a network structure that consists of computer systems, digital and mechanical devices, objects, people, and animals, all linked and equipped with unique identifiers (UIDs). These enable data transfer without the need for human-to-human or human-to-computer interactions. The integration of IoT technology into photolithography equipment enables manufacturers to conduct real-time monitoring and control, data-driven enhancement, and anticipate maintenance needs, resulting in optimized process management, reduced downtime, and improved equipment performance overall. For instance, in 2022, a UK-based non-profit industry group known as the Global Mobile Supplier Association reported that close to 60% of cellular IoT connections could potentially be broad bandwidth IoT by the end of 2028, with 4G being the main connection method. According to the data, there were 13.2 billion IoT connections worldwide in 2022, which are projected to rise to 34.7 billion connections by 2028, presenting a growth rate of 18%. As a result, the growth of the photolithography equipment market will be driven by this upswing in demand for Internet of Things (IoTs).
The photolithography equipment market covered in this report is segmented –
1) By Process: Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV), I-line, Krypton Fluoride (KrF), Argon Fluoride (ArF) Dry, Other Processes
2) By Wavelength: 370 nm–270 nm, 270 nm–170 nm, 70 nm–1 nm
3) By Light Source: Mercury Lamps, Fluorine Lasers, Excimer Lasers, Lased-Produced Plasma
4) By Application: Front-End, Back-End
5) By End-User: Integrated Device Manufacturer (IDM), Foundries
Subsegments:
1) By Deep Ultraviolet (DUV): 248 nm (KrF), 193 nm (ArF)
2) By Extreme Ultraviolet (EUV): 13.5 nm
3) By I-line: 365 nm
4) By Krypton Fluoride (KrF): 248 nm
5) By Argon Fluoride (ArF) Dry: 193 nm
6) By Other Processes: Electron Beam Lithography, Nanoimprint Lithography
Prominent businesses in the photolithography equipment market are concentrating on generating advanced systems, like immersion lithography systems, to tackle obstacles in 3D semiconductor production and gain a market advantage. Immersion lithography systems represent a semiconductor production device in which a liquid, typically water, serves as the optical medium between the projection lens and the wafer during exposure. For example, Nikon Corporation, an optical instruments manufacturer and distributor based in Japan, introduced the NSR-S636E ArF immersion scanner in December 2023. This state-of-the-art immersion lithography system is specifically created for crucial layers in semiconductor production. This scanner delivers excellent overlay precision and extremely high throughput, making it suitable for different structures, including 3D semiconductor devices. Thanks to its enhanced inline Alignment Station (iAS) for sophisticated wafer measurement and correction skills, it can overcome obstacles in 3D semiconductor production, guaranteeing high accuracy and better overlay performance with no impact on productivity.
Major companies operating in the photolithography equipment market include:
• Samsung Electronics Co. Ltd.
• Taiwan Semiconductor Manufacturing Company Limited
• Canon Inc.
• Applied Materials Inc.
• ASML Holding NV
• ZEISS Group
• KLA Corporation
• Nikon Corporation
• JEOL Ltd.
• Onto Innovation Inc.
• Vecco Instruments Inc.
• NuFlare Technology Inc.
• EV Group
• NIL Technology ApS
• Holmarc Opto-Mechatronics Pvt Ltd.
• Orthogonal Inc.
• Microfab Service GmbH
• microfab Service GmbH
• S-Cubed Inc.
• Eulitha AG
• Eulitha AG
• Osiris International GmbH
• Rudolph Technology & Associates
• Shanghai Micro Electronics Equipment (Group) Co. Ltd. (SMEE)
• Orthogonal Inc.
North America was the largest region in the photolithography equipment market in 2024. Asia-Pacific is expected to be the fastest-growing region in the forecast period. The regions covered in the photolithography equipment market report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East, Africa.